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Focused on the Gas industry for 35 years
KrF and ArF gases, collectively referred to in the industry as “(excimer) laser gases,” belong to the category of specialty gases used in semiconductor applications, specifically for photolithography processes. These gases require cutting-edge purification technologies, precise gas mixtures, and a stringent quality management system to ensure batch-to-batch product consistency.
The XeCl laser serves different systems through two distinct mechanisms: In the cardiovascular field, it employs a “cold ablation” approach to directly vaporize calcified plaques, making it a crucial tool for interventional treatment of severe calcification. In dermatology, the same wavelength of light is specifically absorbed by immune cells involved in disease, enabling precise immunomodulation for the treatment of vitiligo and psoriasis. Ophthalmology utilizes an ArF excimer laser (193 nm), whose “ablation effect” is exceptionally fine; by breaking molecular bonds in the cornea, it facilitates tissue remodeling and forms the cornerstone of procedures such as myopia correction (LASIK). Together, these three applications highlight the therapeutic value of laser medicine—precision, targeting, and efficiency.
Excimer lasers for scientific research and industrial applications are gas-based laser media used to generate high-power pulsed lasers at specific wavelengths. Their primary function is to produce laser beams with industrial or scientific applications through gas discharge in corresponding devices. The application areas of these laser beams include deep-ultraviolet lithography light sources in chip manufacturing, industrial processing beams for material cutting and surface treatment, and excitation light sources for scientific research. The gas composition, purity, and related technical specifications of these lasers depend on specific performance parameters such as wavelength, output power, and repetition rate, all of which must comply with particular industrial and scientific application standards.
In display panel manufacturing, high-purity gases are critical process materials: argon (Ar), nitrogen (N₂), and helium (He) are used for film deposition and etching environments as well as for protective purposes; fluorine-based (CF₄) and chlorine-based (Cl₂) gases are employed in dry etching processes; photolithography equipment requires a mixed gas of krypton/fluorine/neon (Kr/F₂/Ne) for its light source; and high-purity nitrogen is essential for providing an inert environment during high-temperature processes and packaging stages. The ultra-high purity and stable supply of these gases directly impact the precision, yield, and cost of display panels.
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