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Mixed gas

F2-Ar-Ne

F2-Ar-Ne

The fluorine-argon-neon mixed gas is composed of three gases—fluorine, argon, and neon—mixed together in specific proportions. This mixed gas is also known as the Fluoro-Argon-Neon mixed gas and has the chemical name F-Ar-Ne mixed gas. In this mixture, "Fluoro" refers to fluorine, "Argon" refers to argon, and "Neon" refers to neon.
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F2-Kr-Ne

F2-Kr-Ne

Fluorine-Krypton-Neon (F₂/Kr/Ne) is also a specialized electronic gas mixture used in high-end manufacturing. Its applications are similar to those of Fluorine-Argon-Neon, with its primary use being in the plasma etching process for semiconductor chips.
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Kr-Ne

Kr-Ne

Krypton-neon is an inert gas mixture primarily used in the field of energy-efficient light sources. By mixing krypton and neon at specific ratios, it can effectively reduce the lamp’s starting voltage, minimize thermal losses, and enhance luminous efficiency.
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Ar-Xe-Ne

Ar-Xe-Ne

The argon-xenon-neon mixed gas leverages the discharge luminescence properties of inert gases and is primarily used in specialized lighting and electrical equipment. It produces a stable arc with high brightness and pure-colored light, making it widely applicable in automotive HID xenon headlights, stadium floodlights, and large-scale projectors.
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Hydrogen chloride

Hydrogen chloride

Hydrogen chloride is a critically important basic chemical, and its most representative form is hydrochloric acid when dissolved in water. In the electronics industry, high-purity hydrogen chloride gas—especially electronic-grade—is known as the “master sculptor” in semiconductor manufacturing.
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Hydrogen bromide

Hydrogen bromide

Hydrogen bromide, like hydrogen chloride, belongs to the family of hydrogen halides; however, its chemical properties differ due to the introduction of the bromine atom, giving it a unique niche in high-end manufacturing. In the electronics industry, hydrogen bromide is primarily used in semiconductor dry etching processes—particularly for etching silicon and germanium materials.
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Hydrogen chloride-based laser mixing gas

Hydrogen chloride-based laser mixing gas

Thin-film processes widely used in the semiconductor industry—including chlorine-based passivation, epitaxial growth, photolithography, ion etching, wafer cleaning, and display panel manufacturing—can also be applied to fields such as cemented carbides, glass surface treatment, pharmaceutical intermediates and fine chemical production, and scientific research.
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