F2-Ar-Ne

The fluorine-argon-neon mixed gas is composed of three gases—fluorine, argon, and neon—mixed together in specific proportions. This mixed gas is also known as the Fluoro-Argon-Neon mixed gas and has the chemical name F-Ar-Ne mixed gas. In this mixture, "Fluoro" refers to fluorine, "Argon" refers to argon, and "Neon" refers to neon.

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The fluorine-argon-neon mixed gas is composed of three gases—fluorine, argon, and neon—mixed together in specific proportions. This mixed gas is also known as the Fluoro-Argon-Neon mixture and has the chemical name F-Ar-Ne mixture. In this mixture, "Fluoro" refers to fluorine, "Argon" refers to argon, and "Neon" refers to neon.

Fluorine-argon-neon is a specialized electronic gas mixture composed primarily of highly corrosive fluorine gas (F₂) and inert gases—argon (Ar) and neon (Ne)—used as diluents. It is mainly employed in advanced processes for semiconductor chip manufacturing and flat-panel display production, particularly for cleaning plasma etching and chemical vapor deposition (CVD) chambers. This gas mixture enables the precise removal or patterning of microscopic circuit structures, making it an indispensable key material in high-end manufacturing.

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