Hydrogen chloride-based laser mixing gas

Thin-film processes widely used in the semiconductor industry—including chlorine-based passivation, epitaxial growth, photolithography, ion etching, wafer cleaning, and display panel manufacturing—can also be applied to fields such as cemented carbides, glass surface treatment, pharmaceutical intermediates and fine chemical production, and scientific research.

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Hydrogen chloride-based laser mixing gas

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Thin-film processes widely used in the semiconductor industry—including chlorine-based passivation, epitaxial growth, photolithography, ion etching, wafer cleaning, and display panel manufacturing—can also be applied in fields such as cemented carbides, glass surface treatment, pharmaceutical intermediates and fine chemical production, and scientific research.

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Helium argon carbon dioxide

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