Boron trichloride mixed gas
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Boron trichloride mixed gas is a specialized electronic gas prepared by precisely blending high-purity boron trichloride with a carrier gas (such as argon or nitrogen) in specific proportions.
The core application of this gas lies in its use as a P-type dopant. In semiconductor manufacturing processes—particularly during the ion implantation step—boron trichloride mixed gases are employed to precisely introduce boron atoms into silicon wafers, thereby altering and controlling the electrical conductivity of specific regions and forming the necessary P-type semiconductor structures.
Therefore, the boron trichloride mixed gas is one of the key process materials used in integrated circuit manufacturing to achieve precise doping and determine device performance.
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