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F2-Ar-Ne

F2-Ar-Ne

The fluorine-argon-neon mixed gas is composed of three gases—fluorine, argon, and neon—mixed together in specific proportions. This mixed gas is also known as the Fluoro-Argon-Neon mixed gas and has the chemical name F-Ar-Ne mixed gas. In this mixture, "Fluoro" refers to fluorine, "Argon" refers to argon, and "Neon" refers to neon.
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F2-Kr-Ne

F2-Kr-Ne

Fluorine-Krypton-Neon (F₂/Kr/Ne) is also a specialized electronic gas mixture used in high-end manufacturing. Its applications are similar to those of Fluorine-Argon-Neon, with its primary use being in the plasma etching process for semiconductor chips.
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Kr-Ne

Kr-Ne

Krypton-neon is an inert gas mixture primarily used in the field of energy-efficient light sources. By mixing krypton and neon at specific ratios, it can effectively reduce the lamp’s starting voltage, minimize thermal losses, and enhance luminous efficiency.
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Ar-Xe-Ne

Ar-Xe-Ne

The argon-xenon-neon mixed gas leverages the discharge luminescence properties of inert gases and is primarily used in specialized lighting and electrical equipment. It produces a stable arc with high brightness and pure-colored light, making it widely applicable in automotive HID xenon headlights, stadium floodlights, and large-scale projectors.
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Hydrogen chloride-based laser mixing gas

Hydrogen chloride-based laser mixing gas

Thin-film processes widely used in the semiconductor industry—including chlorine-based passivation, epitaxial growth, photolithography, ion etching, wafer cleaning, and display panel manufacturing—can also be applied to fields such as cemented carbides, glass surface treatment, pharmaceutical intermediates and fine chemical production, and scientific research.
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