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Fluorine-nitrogen mixed gas

Fluorine-nitrogen mixture is a special mixed electronic gas blended with fluorine and nitrogen in specific proportions. It is a pale yellow gas with a pungent odor at room temperature. With active chemical properties, it combines the strong oxidizability of fluorine and the stabilizing effect of nitrogen. Nitrogen reduces the activity of fluorine and improves operational safety while retaining its functions for etching and cleaning. As a highly hazardous corrosive chemical, it is widely used in the semiconductor industry for chamber cleaning, wafer etching and thin film treatment. It requires strict control over purity and ratio. Special anti-corrosion equipment and standard safety procedures must be adopted during storage, transportation and operation

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Fluorine-nitrogen mixed gas
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  • Fluorine-nitrogen mixed gas

Product Details

Chemical Formula：SbF5

Cas：F2：7782-41-4、N2：7727-37-9

Purity: 99%

Appearance: Pale yellow gas with a pungent odour

 

Applications of Fluorine-nitrogen Mixed Gas

Fluorine-nitrogen mixed gas is an essential electronic gas in modern semiconductor manufacturing. It is predominantly used for in-situ cleaning of reaction chambers, efficiently removing residual deposits after thin-film processes to maintain equipment stability and production yield. It also serves for precise wafer etching and surface treatment of semiconductor components. The nitrogen component dilutes fluorine to moderate its strong reactivity, lowering risks during production. Besides the semiconductor field, it is applied in optoelectronic material processing and precision chemical treatment. Due to its corrosiveness and toxicity, all delivery, use and exhaust treatment must follow strict industrial safety standards, and be handled by well-trained professional operators.

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