Among the myriad processes involved in chip manufacturing, lithography is hailed as the “pearl atop the crown.” And what drives this pearl to shine with dazzling brilliance are none other than bottles that may look ordinary yet are packed with cutting‑edge technology. ArF excimer laser gas 。

In early 2026, the lithography gas products of Yueyang Kaimite Electronic Special Rare Gases Co., Ltd. officially passed the review by Cymer, a subsidiary of ASML, the global giant in lithography equipment, and were added to its list of qualified suppliers. This marks that ArF excimer laser gases manufactured in China have reached the world’s leading level.

Today, we will provide an in-depth analysis of: How is a 193 nm wavelength generated? What role does it play in chip manufacturing? Why has Yueyang Kaimite’s ArF laser gas earned recognition from international industry giants?

1. What is an ArF excimer laser gas?

1.1 Definitions and Principles

ArF excimer laser gas is a working medium specifically used to generate deep ultraviolet lasers with a wavelength of 193 nm. It is not a single gas, but rather a mixture composed of… Argon (Ar), fluorine gas (F₂), and buffer gases (neon Ne/helium He) Special gases blended in precise proportions. Under the excitation of a high‑voltage electric field, argon atoms instantly combine with fluorine atoms to form excited-state ArF molecules (excimers). When these molecules return to their ground state, they emit photons with a wavelength of 193 nm. The entire process is completed within tens of nanoseconds, generating a high‑energy, short‑pulse deep ultraviolet laser.

1.2 Typical Proportions

Depending on the specific lithography machine model and application requirements, the gas composition of ArF laser gas varies. Taking mainstream ArF laser gas used in medical and research applications as an example, the typical composition is:

Helium (He) : 94.77%; Neon (Ne) 5%; Fluorine gas (F₂) 0.23%; Argon (Ar) : Trace amounts (participating in the reaction) -3

In semiconductor lithography applications, higher precision is required for formulation ratios, and the control accuracy of component concentrations must reach… 0.01% Level -2。

2. 193 nm Wavelength: Why Is It the “Golden Wavelength” for Chip Lithography?

2.1 Physical Laws Governing Wavelength and Resolution

The resolution of a lithography machine is determined by the Rayleigh criterion: CD = k₁ × λ / NA

Among them:

CD (Critical Dimension): The minimum line width that can be engraved; λ : Light source wavelength; NA Objective numerical aperture; k₁ : Process-related constants

As can be seen from the formula, Shortening the wavelength is the most direct way to improve resolution. Compared with the previous generation of 248nm KrF lasers, 193nm ArF lasers feature a 22% shorter wavelength and can theoretically improve resolution by about 30%.

2.2 Technical Positioning of 193 nm

Comparison of Current Mainstream Lithography Technologies:

According to the Ministry of Industry and Information Technology’s “Guidance Catalog for the Promotion and Application of First-of-its-Kind Major Technical Equipment (2024 Edition),” The ArF lithography machine has a resolution of ≤65 nm and an overlay accuracy of ≤8 nm. …which can meet the mass production requirements of 28nm mature process technology. -9 Through immersion technology, ArF light sources can support advanced 7nm process nodes.

2.3 The Unique Advantages of Photon Energy

The photon energy at 193 nm is as high as… 6.4eV It is powerful enough to break most chemical bonds, enabling “cold machining” — precisely cutting materials while generating virtually no heat-affected zone. This unique characteristic makes it suitable not only for lithography but also widely used in fields such as ophthalmic surgery (LASIK).

3. Core Technical Requirements for ArF Excimer Laser Gases

3.1 Ultimate Purity

The purity requirements for ArF laser gas are nearly stringent:

Basic gas purity Argon, neon, and helium must meet a purity level of 99.9999% (6N) or higher. -10

Fluorine gas purity ≥99.9%, and impurities—especially moisture and oxygen—must be controlled at the ppb level.

Total metallic impurities ≤10 ppb

Any trace of impurities can lead to:

Laser output power degradation

Decreased wavelength stability

Optical lens contamination

Corrosion of the lithography machine chamber

3.2 Precise Proportions

The component ratio of ArF laser gas directly affects laser performance. The mainstream lithography machines require a mixing ratio accuracy of… ±0.01% This means that in a standard gas cylinder, the deviation of each component must not exceed one thousandth. -2。

Equipped by Yueyang Kaimite 12 sets of electronic specialty gas purification and blending production units , in coordination with ICP-MS, GC-MS, Fourier Transform Infrared Spectrometer More than 40 imported analytical instruments ensure the precise formulation and batch-to-batch consistency of every product lot.

3.3 Wavelength Stability

In actual lithography processes, the wavelength stability of ArF lasers must be controlled within… ±0.1 pm Within this range, the deviation over a distance of one kilometer does not exceed the diameter of a single strand of hair.

The ArF laser gas produced by Yueyang Kaimite Electronic Specialty Gases, through precise control of gas ratios and purity, helps lithography machines achieve:

Wavelength drift: <0.05 pm/100 million pulses

Output power stability: <1% fluctuation

Pulse energy consistency: >99%

3.4 Cylinder Handling

The packaging containers for electronic specialty gases pose the greatest challenge in ensuring purity. Yueyang Kaimite Electronic Specialty Gases has invested heavily in introducing internationally leading… Fully Automatic Cylinder Cleaning Production Line , perform the following for each steel cylinder:

Internal mirror‑finish grinding; high‑temperature vacuum baking; high‑purity gas purging; final inspection and verification; ensuring that the gas remains free from any secondary contamination from the time of manufacture until it is put into use.

4. ArF Laser Gas from Yueyang Kaimite Electronic Specialty Gases: “Made in China” with International Certification

4.1 Certification Milestones

The ArF laser gas and related lithography gas products of Yueyang Kaimite Electronic Special Gases have received full recognition from international equipment manufacturers.

At this point, Yueyang Kaimite Electronic Specialty Gases has become one of the few domestic companies that have simultaneously obtained… Dual Certification by ASML and GIGAPHOTON an electronic specialty gas supplier.

4.2 Technical Strength Assurance

Production facilities 12 sets of electronic specialty gas purification and blending production units

Detection Capability More than 40 imported analytical instruments, capable of detecting impurities at the ppb level.

Quality Control System : Certified under the ISO 9001 Quality Management System

Fully qualified Complete set of qualifications, including the Safety Production License and the Gas Cylinder Filling License.

4.3 Capacity Assurance

The company has successfully implemented a rare gas project with an annual capacity of 90,000 cubic meters and now possesses the capability to supply on a large scale.

High‑purity neon gas 60,000 standard cubic meters/year

High‑purity krypton gas 2,000 standard cubic meters/year

High‑purity xenon 200 standard cubic meters/year

High‑purity helium 15,000 standard cubic meters/year

It provides a solid supply guarantee for the stable provision of ArF laser gas.

V. Industry Outlook: The Future of ArF and Kaimite’s Mission

5.1 EUV and DUV: Complementary, Not Substitute

With the advancement of 3nm and 2nm process technologies, EUV lithography has become the focal point. However, according to industry consensus: EUV and DUV are not mutually exclusive; rather, they complement and coexist. 。

An industry insight published in October 2025 on the official website of Yueyang Kaimite Electronic Specialty Gases stated: “As the next-generation lithography technology, extreme ultraviolet lithography is being developed to further break through physical limitations. This technology indirectly involves the application of carbon dioxide and hydrogen, and it complements existing deep ultraviolet lithography rather than replacing it in the foreseeable future.”

This means that, The demand for ArF excimer laser gas will continue to grow over the next 5–10 years. 。

5.2 Emerging Technologies: Hybrid ArF Lasers

Recent research has shown that combining a narrow-linewidth solid-state 193 nm seed laser with an ArF excimer amplifier can significantly enhance laser coherence and linewidth stability, opening up new avenues for cutting‑edge applications such as interference lithography. This “hybrid ArF laser” places higher demands on gas purity and further raises the technological barriers for excimer laser gases.

5.3 Accelerated Domestic Substitution

Released by the parent company, Kaimite Gas The 2025 annual performance forecast indicates that net profit is expected to range from 65 million to 80 million yuan, successfully turning a loss into a profit. …mainly thanks to the steady growth in revenue from its core business of electronic specialty gases. On the investor interaction platform, the company clearly stated “… Continuously advance the expansion of the electronic specialty gas market. With the expansion of domestic wafer fab capacity and the growing demand for supply chain security, Yueyang Kaimite Electronic Specialty Gases is poised to seize a historic opportunity for development.