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SiF4
For the preparation of fluorosilicic acid and lead fluoride, also used as cement and artificial marble hardener, organic silicon compound synthetic materials
Synthetic materials of organosilicon compounds, hardener of cement and artificial marble, MANUFACTURE of fluorosilicic acid and silicon fluoride, epitaxial growth of silicon, plasma etching, solar cells, photocopiers, formation of amorphous silicon film, chemical vapor deposition. The highly corrosive fluorosilicic acid is formed in the presence of water. It is mainly used for plasma etching of silicon nitride (Si3N4) and tantalum silicide (TaSi2), P-type doping of light-emitting diodes, ion implantation process, silicon source of epitaxial deposition diffusion and raw material of high-purity quartz glass for optical fiber.
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